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PVD systems

 

SPArc

  Hydra   Medusa

- High vacuum system.

  - Ultra high vacuum system.   - High vacuum system.
- Pulsed plasma from three cathodes.   - Industrial size dc arc. Three cathodes.   - Industrial size dc arc.
- Equipped with a 90º curved plasma filter.   - Magnetron sputtering. Five targets.  

- Rotatable arc source.

         

Currently our experimental activities are based on three thin film deposition systems. All three are unique and constructed to be in the forefront position regarding deposition systems:

- SPArc is based on pulsed plasma generation from multiple arc cathodes.
- Hydra is based on large flexibility for thin fim depositions using cathodic arc or magnetron sputtering.
- Medusa is based on industrial scale arc sources (63 mm cathode) that can be either at a stationary or rotatable position.

The three thin film deposition systems will facilitate exciting material synthesis, including, but not being limited to, ceramic materials and binary, ternary, and quaternary alloys. The systems will also allow plasma characterization studies, in situ thin film characterization, and general technique development.

SPArc

This system is in operation since 2008

SPArc is a high vacuum chamber system equiped with three cathodes for pulsed plasma generation. The PVD chamber is shaped as a half toroidal to enable efficiently reduction of non-charged particles in the plasma by transferring the highly ionised plasma through a 90º curved filter.

The sample handling system includes a load-lock chamber for convenient sample exchange, magnetically coupled transfer arm, and a sample manipulator for flexible positioning. One sample up to 1 inch diameter or one sample of 10 x 10 mm2 can be mounted and temperature controlled in the temperature range 20-1000 ºC.

Reactive gases (N2, O2, and/or CH4) can be introduced into the PVD chamber. Several small ports allow process surveillance through viewports, in situ measurements by e.g. stress evolution monitors, ellipsometry, plasma probes, and gas analyzers.

Hydra

This system is in operation since 2012

Hydra is designed for large flexibility for thin fim deposition using cathodic arc or magnetron sputtering. The PVD chamber has a diameter of 600 mm and can reach a base pressure around 5 x 10-10 mbar. Three large CF-300 flanges, all pointing towards the center of the chamber, can be equipped either with arc sources of industrial scale (63 mm cathode), pulsed arc sources (25 mm cathode), magnetron sputtering sources (2 and 3 inch target), etc. Up to three industrial scaled arc sources or up to ten magnetrons can be mounted simultaneously: one magnetron source for liquid targets can be mounted from the bottom of the PVD chamber. Co-deposition from several sources, even combining arc- and sputtering deposition, or combinatorial studies are thus possible.

The sample handling system includes a load-lock chamber for convenient sample exchange, magnetically coupled transfer arm, and a motorized sample manipulator for flexible positioning. The position of the transfer arm and sample manipulator can easily be exchanged for different experimental sample-source geometry. Hydra also allows exchange of sample rods without breaking vacuum in the PVD chamber and at present there are two sample rods available for different sample-source geometry. One sample up to 2 inch diameter or up to six samples of 10 x 10 mm2 can be mounted and temperature controlled in the temperature range -100-1000 ºC.


Reactive gases (N2, O2, and/or CH4) can be introduced into the PVD chamber and kept at constant pressure through a feedback control system. Several smaller and larger ports allow process surveillance through viewports, in situ measurements by e.g. stress evolution monitors, ellipsometry, plasma probes, and gas analyzers. To avoid excessive deposition on the chamber walls an interior shield rests on the bottom flange, which easily can be removed for exchange or restoration.

Medusa

This system is under construction

Medusa is a high vacuum chamber system equiped with one industrial scaled arc source (63 mm cathode). The arc source can be either at a stationary or rotatable position. The stationary position enable efficiently reduction of non-charged particles in the plasma by transferring the highly ionised plasma through a filter while the rotatable position allows changeable source-sample geometry.

One sample up to 1 inch diameter or one sample of 10 x 10 mm2 can be mounted and temperature controlled in the temperature range 20-1000 ºC.

Reactive gases (N2, O2, and/or CH4) can be introduced into the PVD chamber.

Medusa is designed mainly for plasma studies, but thin film depositions will also be performed.


Responsible for this page: Thomas Lingefelt
Last updated: 05/07/13