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The overall research program concerns the materials science and nanotechnology of thin films. It is aimed at increasing the understanding of vapor phase deposition, ion-surface interactions, and reactions in advanced materials. We explore the thermodynamics and kinetic pathways responsible for phase and nanostructure formation.

We probe into the nature of epilayers, textured thin films, and nanoscale materials. Model systems include transition metal nitrides, carbides, oxides, and borides; wide-band gap nitrides; multifunctional ceramics; thermoelectrics; piezoelectrics; nanocomposites; superlattices; fullerene-like compounds; and nm-sized metallic multilayers.

Several reactive deposition techniques are covered including:

  • Unbalanced magnetron sputtering
  • Magnetron sputter epitaxy (MSE)
  • High power pulsed magnetron sputtering (HIPIMS)
  • Direct current arc
  • High-current pulsed arc
  • Pulsed filtered arc
  • Hybrid PVD/CVD processes

Our materials science laboratory specializes in developing methods for plasma characterization, analytical and high-resolution electron microscopy, X-ray diffraction, nanoindentation, ab initio calculations including our Synthetic Growth Concept, and multi-billion time-step molecular dynamics simulations.

Responsible for this page: Thomas Lingefelt
Last updated: 02/02/18