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Adamovic D, Chirita V, Münger P, Hultman L, Greene J. Enhanced intra- and interlayer mass transport on Pt(111) via 5-50 eV Pt atom impacts on two-dimensional Pt clusters. Thin solid films : an international journal on the science and technology of thin and thick films 2006;515 p.2235-2243.

Eriksson F, Ghafoor N, Schäfers F, Gullikson E, Birch J. Interface engineering of short-period Ni/V multilayer X-ray mirrors. Thin solid films : an international journal on the science and technology of thin and thick films 2006;500 p.84-95.

Ghafoor N, Eriksson F, Persson P, Schäfers F, Birch J. Interface engineered ultra-short period Cr/Ti multilayers as high reflectance mirrors and polarizers for soft X-rays of l=2.74 nm wavelength. Applied optics : a bimonthly publication of the Optical society of America 2006;45 p.137-143.

Lattemann M, Ehiasarian A, Böhlmark J, Persson P, Helmersson U. Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel. Surface and Coatings Technology 2006;200 p.6495-6499.

Lattemann M, Sell K, Ye J, Persson P, Ulrich S. Stress reduction in nanocomposite coatings consisting of hexagonal and cubic boron nitride. Surface and Coatings Technology 2006;200 p.6459-6464.

Manfred B, Schell N, Martins R, Mücklich A, Möller W, Hultman L. Microstructure and non-basal plane growth of epitaxial MAX phase Ti2AlN thin films. Journal of applied physics 2006;99 p.034902-1-034902-8.

Palacio J, Bull S, Neidhardt J, Hultman L. Nanoindentation response of high performance fullerene-like CNx. Thin solid films : an international journal on the science and technology of thin and thick films 2006;494 p.63-68.

Persson P, Hultman L, Janson M, Hallén A. Ostwald ripening of interstitial-type dislocation loops in 4H-SiC. Journal of applied physics 2006;100 p.053521-1-053521-8.

Riascos H, Neidhardt J, Radnoczi G, Emmerlich J, Zambrano G, Hultman L, Prieto P et al. Structure and properties of pulsed-laser deposited carbon nitride thin films. Thin solid films : an international journal on the science and technology of thin and thick films 2006;497 p.1-6.

Trinh D, Högberg H, Andersson J, Collin M, Reineck I, Helmersson U, Hultman L et al. RF dual magnetron sputtering deposition and characterization of nanocomposite Al2O3 -ZrO2 thin films. Journal of vacuum science & technology. A 2006;24 p.309-316.

Adamovic D, Münger P, Chirita V, Hultman L, Greene J. Low-energy ion irradiation during film growth: Kinetic pathways leading to enhanced adatom migration rates. Applied physics letters : a publication of the American Institute of Physics 2005;86 p.21915-1-21915-3.

Berlind T, Poksinski M, Hultman L, Tengvall P, Arwin H. Adsorption of human serum albumin on carbon nitride films studied with in-situ ellipsometry. American Vacuum Society 52 Int Symposium and Exhibition; 2005 Boston. 2005.

Berlind T, Poksinski M, Hultman L, Tengvall P, Arwin H. Bioadsorption studies on carbon nitride films using in-situ ellipsometry. E-MRS spring meeting; 2005 Strasbourg. 2005.

Bouianova I, Izadifard M, Ivanov I, Birch J, Chen W, Felici M, Polimeni A et al. Unusual effects of hydrogen in GaNP alloys: A general property of dilute nitrides. 2005 MRS Spring Meeting; 2005 San Francisco, USA. 2005.

Eklund P, Emmerlich J, Högberg H, Wilhelmsson O, Isberg P, Birch J, Persson P et al. Structural, Electrical, and Mechanical Properties of nc-TiC/a-SiC Nanocomposite Thin Films. Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena 2005;23 p.2486-2495.

Eklund P, Emmerlich J, Högberg H, Hultman L, Wilhelmsson O, Jansson U, Isberg P et al. Synthesis and characterization of Ti-Si-C compounds for electrical contact applications. IEEE Holm Conference on Electrical Contacts; 2005 51; Chicago. Piscataway:IEEE; 2005.

Eklund P. Thin Film Growth and Characterization of Ti-(Si,Ge)-C Compounds. Linköping: Linköpings universitet; 2005.

Flink A, Larsson T, Sjölén J, Karlsson L, Hultman L. Influence of Si on the microstructure of arc evaporated (Ti,Si)N thin films; evidence for cubic solid solutions and their thermal stability. Surface and Coatings Technology 2005;200 p.1535-1542.

Gago R, Jimenez I, Neidhardt J, Abendroth B, Caretti I, Hultman L, Moller W et al. Correlation between bonding structure and microstructure in fullerenelike carbon nitride thin film. Physical review. B, Condensed matter and materials physics 2005;71 p.125414-1-125414-6.

Gago R, Neidhardt J, Vinnichenko M, Kreissig U, Czigany Z, Kolitsch A, Hultman L et al. Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation: On the mechanisms for fullerene-like microstructure formation. Thin solid films : an international journal on the science and technology of thin and thick films 2005;483 p.89-94.

Ghafoor N. Growth and Nano-structural Studies of Metallic Multilayers for X-ray Mirrors. Linköping: Linköpings universitet; 2005.

Gueorguiev G, Neidhardt J, Stafström S, Hultman L. First-principles calculations on the curvature evolution and cross-linkage in carbon nitride. Chemical physics letters 2005;410 p.228-234.

Hallin C, Kakanakova-Gueorguie A, Persson P, Janzén E. High quality 6H-SiC (0001) homoepitaxial layers as substrate surface for growth of AlN epitaxial layers. Physica status solidi. C, 2005;2 p.2109-2112.

Hellgren N, Guo J, Luo Y, Sathe C, Aqui A, Kashtanov S, Nordgren J et al. Electronic structure of carbon nitride thin films studied by X-ray spectroscopy techniques. Thin solid films : an international journal on the science and technology of thin and thick films 2005;471 p.19-34.

Hultman L. Synthesis, Structure, and Properties of Super-Hard Superlattice Coatings. In:A. Cavaleiro and J. Th. M. De Hosson, editors. Hard Nanostructured Coatings. null ed.Plenum Press; 2005. p.0-0.

Hultman L, Mitterer C. Thermal Stability of Advanced Nano-structured Wear-Resistant Coatings. In:A. Cavaleiro and J.Th. M. De Hosson, editors. Hard nanostructured coatings. null ed.Plenum Press; 2005. p.0-0.

Högberg H, Eklund P, Emmerlich J, Birch J, Hultman L. Epitaxial Ti2GeC, TiGeC2, and Ti4GeC3 MAX-phase thin films grown by magnetron sputtering. Journal of materials research 2005;20 p.779-782.

Högberg H, Hultman L, Emmerlich J, Joelsson T, Eklund P, Molina-Aldareguia J, Palmquist J et al. Growth and characterization of MAX-phase thin films. Surface and Coatings Technology 2005;193 p.6-10.

Hörling A, Hultman L, Odén M, Sjölen J, Karlsson L. Mechanical properties and machining performance of Ti(1-x)Al(x)N cutting tools. Surface and Coatings Technology 2005;191 p.384-392.

Hörling A. Thermal Stability and Age Hardening of TiN-based Thin Films. Linköping: Linköpings universitet; 2005.

Isberg P, Eklund P, Emmerlich J, Hultman L, Högberg H, Ljungcrantz H. Amorphous and nanocomposite MAX compounds for wear protective coatings on components and tools as well as electrical contacts. 2005.

Janzén E, Bergman P, Danielsson Ö, Forsberg U, Hallin C, ul-Hassan J, Henry A et al. SiC and III-nitride Growth in a Hot-wall CVD Reactor. Materials science forum 2005;483-485 p.61-66.

Joelsson T, Hultman L, Hugosson H, Molina-Aldareguia J. Phase stability tuning in the Nbx Zr1-xN thin-film system for large stacking fault density and enhanced mechanical strength. Applied physics letters : a publication of the American Institute of Physics 2005;86 p.131922-1-131922-3.

Joelsson T, Hörling A, Birch J, Hultman L. Single-crystal Ti2AlN thin films. Applied physics letters : a publication of the American Institute of Physics 2005;86 p.111913-1-111913-3.

Joelsson T. Nanostructural Design of Transition Metal Nitride Thin Films. Linköping: Linköpings universitet; 2005.

Kasic A, Gogova D, Larsson H, Ivanov I, Birch J, Monemar B, Fehrer M et al. Highly homogeneous bulk-like 2'' GaN grown by HVPE on MOCVD-GaN template. Journal of crystal growth 2005;275 p.e387-e393.

Magnuson M, Palmquist J, Mattesini M, Li S, Ahuja R, Eriksson O, Emmerlich J et al. Electronic structure investigation of Ti3AlC2, Ti3SiC2, and Ti3GeC2 by soft x-ray emission spectroscopy. Physical review. B, Condensed matter and materials physics 2005;72 p.245101-1-9.

Neidhardt J, Högberg H, Hultman L. Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering; Suppression of the chemical desorption process. Thin solid films : an international journal on the science and technology of thin and thick films 2005;478 p.34-41.

Paskova T, Darakchieva V, Paskov P, Birch J, Valcheva E, Persson P, Arnaudov B et al. Nonpolar a-plane HVPE GaN: growth and in-plane anisotropic properties. Physica status solidi. C, 2005;2 p.2027-2031.

Paskova T, Darakchieva V, Paskov P, Birch J, Valcheva E, Persson P, Arnaudov B et al. Properties of nonpolar a-plane GaN thick films grown by HVPE with AlN buffers. Journal of crystal growth 2005;281 p.55-61.

Radnóczi G, Seppänen T, Pécz B, Hultman L, Birch J. Growth of highly curved Al1-xInxN nanocrystals. Physica status solidi. A, Applied research 2005;202 p.R76-R78.

Seppänen T, Persson P, Hultman L, Birch J, Radnoczi G. Magnetron sputter epitaxy of wurtzite Al1-xInxN (0.1 x 0.9) by Dual Reactive DC Magnetron Sputter Deposition. Journal of applied physics 2005;97 p.83503-1-83503-9.

Söderberg H, Odén M, Molina-Aldareguia J, Hultman L. Nanostructure formation during deposition of TiN/SiNx nanomultilayer films by reactive dual magnetron sputtering. Journal of applied physics 2005;97 p.114327-1-114327-8.

Yakimova R, Kakanakova-Gueorguie A, Yazdi G, Gueorguiev G, Syväjärvi M. Sublimation growth of AIN crystals: Growth mode and structure evolution. Journal of crystal growth 2005;281 p.81-86.

Lattemann M, Ehiasarian A, Böhlmark J, Persson P, Helmersson U. Investigation of High Power Impulse Magnetron Sputtering Pretreated Interfaces for Adhesion Enhancement of Hard Coatings on Steel. Surface and Coatings Technology 0; p.null.

Lattemann M, Sell K, Ye J, Persson P, Ulrich S. Stress reduction in nanocomposite coatings consisting of hexagonal and cubic boron nitride. Surface and Coatings Technology 0; p.null.

Mayrhofer P, Mitterer C, Hultman L, Clemens H. Microstructural design of hard coatings. Progress in materials science 0; p.null.


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Last updated: 05/05/08