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ERIKSSON, Fredrik: Soft X-ray multilayer mirrors.

Dissertation No 875 (14 maj 2004)

NEIDHARDT, Jörg: Fullerene-Like Carbon Nitride Thin Solid Films.

Dissertation No 877 (28 maj 2004)

A.P. Ehiasarian, P. Eh. Hovsepian, L. Hultman, and U. Helmersson: “Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced

magnetron technique” Thin Solid Films, 457, 270 (2004).

A. Hörling, M. Odén, J. Sjölén, L. Karlsson, and L. Hultman: “The Mechanical Properties and Machining Performance of Arc Evaporated Ti1-xAlxN Coatings”, Surf. Coat. Technol.

A. Kakanakova-Georgieva, P.O.Ĺ Persson, R. Yakimova, L. Hultman, and E. Janzén , “Sublimation Epitaxy of AlN on SiC; Growth Morphology and Structural Features”, J.

Cryst. Growth 273 161-166

D. Music, V. Chirita, J.M. Schneider, and U. Helmersson: "Effect of chemical composition on the elastic and electrical properties of the boron-oxygen-yttrium system studied by ab initio and experimental means", Phys.Rev.B 69, 92103

E. Wallin, J.M. Andersson, V. Chirita, and U. Helmersson, "Effects of additives in α - and θ -alumina: An ab initio study ", Journal of Physics, J. Phys.: Condens. Matter 16,

8971-8980 (2004).

I. Brunell, J. Neidhardt, Zs. Czigány, and L. Hultman: “Insitu Stress Measurement during de-position of Fullerene- Like CNx Thin Films by Unbalanced Magnetron Sputtering; Formation of High Levels of Stress with 28 eV Ion Irradiation”, Phil Mag., G. K. Gueorguiev, J. Neidhardt, S. Stafström and L. Hultman: ”First-principles calculations on the role of CN precursors for the formation of fullerene-like Carbon Nitride”, Chem. Phys. Lett. G. K. Gueorguiev, J. M. Pacheco and D. Tomanek: "Quantum Size Effects in the Polarizability of Carbon Fullerenes", Phys. Rev. Lett., 92, 215501-215504

H. Högberg, L. Hultman, J. Emmerlich, T. Joelsson, P. Eklund, J.M.Molina-Aldareguia, U. Jansson, J.-P. Palmquist, and O. Willhelmsson: “The Materials Science of MAX-Phase Thin Films”, Surf. Coat. Technology J.-P. Palmquist, S. Li, P.O.Ĺ. Persson, J. Emmerlich, O.

Wilhelmsson, H. Högberg, M.I. Katsnelson, B. Johansson, R. Ahuja, O. Eriksson, L. Hultman and U. Jansson: “Mn+1AXn phases in the Ti-Si-C system studied by thin film synthesis and ab initio calculations”, Phys. Rev. B, 70, 165401 (2004).

J. Rosén, A. Anders, L. Hultman, and J.M. Schneider: ”Charge State and Time-Resolved Plasma Composition ofa Pulsed Zirconium Arc in a Nitrogen Environment”, J. Appl. Phys.

J. Emmerlich, H. Högberg, T. Seppänen, J. Molina, J. Birch, J.-P. Palmquist, U. Jansson, P. Isberg, and L. Hultman: “Thin Films of TiSiC MAX-Phases; Growth

J. Emmerlich, J.-P. Palmquist, H. Högberg, J. M. Molina- Aldareguia, Zs. Czigány, Sz. Sasvári, P.O. Ĺ. Persson, U. Jansson, and L. Hultman: “Growth of Ti3SiC2 thin films by elemental target magnetron sputtering”, J. Appl. Phys., 96, 4817-4826 (2004).

J. Neidhardt, L. Hultman, E. Broitman, T.W. Scharf, and I.L. Singer: “Structural, Mechanical and Tribologi-cal Behavior of Fullerene-like and Amorphous Carbon Nitride Coatings Synthesized by DC Reactive Magne-tron Sputtering”, Diamond and Related Materials in J. Neidhardt, H. Högberg, and L. Hultman: “Cryogenic

Deposition of Carbon Nitride Thin Solid Films by Reactive Magnetron Sputtering; Suppression of the Chemical Desorption Process”, Thin Solid Films in press (2004).

J. Neidhardt, Zs. Czigány, and L. Hultman: “Correlated HREM and XPS Studies of Structure CNx (0≤x≤0.25)”, Carbon in press (2004).

J. Neidhardt, H. Högberg and L. Hultman: “Arrhenius-type Temperature Dependence of the Chemical Desorption Processes active during Depositions of Fullerene-Like Carbon Nitride Thin Films”, Surf. Sci. Lett., 596, L289- L295 (2004).

J. Bohlmark, J.T. Gudmundsson, J. Alami, M. Latteman, and U. Helmersson: “Spatial electron density distribution in a high power pulsed magnetron discharge”, IEEE images in plasma science, accepted with minor revision, Nov. 2004.

J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian, and U. Helmersson: “Ionization of sputtered metals in high power pulsed magnetron sputtering”, J.Vac.Sci.Technol.A, 23, 18


J. Bohlmark, U. Helmersson, M. VanZeeland, I. Axnäs, J. Alami, and N. Brenning: “Measurement of the magnetic field change in a pulsed high current magnetron

discharge”, Plasma Sources Science Tecnol. 13, 654-661 (2004).

J.M. Andersson, E. Wallin, V. Chirita, E.P. Münger, and U. Helmersson: “Ab inito calculations on the effects of additatives on alumina phase stability”, Phys. Rev. B 70,


J. M. Andersson, Zs. Czigány, P. Jin, and U. Helmersson: “Microstructure of α -alumina thin films deposited at low temperatures on chromia template layers”, J.Vac.Sci.Technol. A 22, 117

J. Hallstedt, M. Blomqvist, P.O.A. Persson, L. Hultman, and H.H.Radamson: “The effect of carbon and germanium on phase transformation of nickel on Si/sub 1-x-y/Ge/sub x/C/sub y/ epitaxial layers”, J. of App. Phys., 95 2397-402 (2004).

J. Hallstedt, E. Suvar, P.O.A. Persson, L. Hultman, Y.-B. Wang, and H.H.Radamson: “Growth of high quality epitaxial Si/sub 1-x-y/Ge/sub x/C/sub y/ layers by using chemical vapor deposition”,

App. Surf. Sci. 224, 46-50 (2004).

N. Hellgren, T. Berlind, G. Gueorguiev, M.P. Johansson, S. Stafström, and L. Hultman: “Fulle-rene-like B-C-N Thin Films ; A Computational and Experimental Study”,

Materials Science & Engineering B113, 242-247 (2004).

N. Konofaos, E.K. Evangelou, Z. Wang, and U. Helmersson: “Properties of Al/SrTiO3/ITO capacitors for DRAM microelectronics”, IEEE Transactions on Electron

Devices 51, 1202 (2004).

R. Gago, J. Neidhardt, M. Vinnichenko, U. Kreissig, Zs. Czigány, A. Kolitsch, L. Hultman, and W. Möller: “Synthesis of Carbon Nitride Thin Films by Low-Energy Ion Beam Assisted Evaporation; on the Mechanisms for Fullerene-like Microstructure Formation”, Thin Solid

Films, in press (2005).

S. Nakagomi, G. Wingqvist, A.E. Ĺbom, U. Helmersson, and A. Lloyd Spetz, “Hydrogen sensing by NKN thin film with high dielectric constant and Ferro-electric property”,

Sensors & Actuators B, accepted Nov. (2004).

T. Joelsson, H. Hugosson, J. Molina, and L. Hultman: “Phase Stability Tuning in the Zr-Nb-N Thin Films System for large Stacking Fault Denisty and Enhanced Mechanical

Strength; DFT calcualtions and Experiments”, Appl. Phys. Lett., in press (2005).

T. Joelsson, A. Hörling, and L. Hultman: “Growth and Characterization of Ti2AlN MAX Phase Thin films”, Appl. Phys. Lett. in press (2004).

T. Seppänen, G.Z Radnóczi, P.O.Ĺ Persson, L. Hultman, and J. Birch “Magnetron Sputter Epitaxy of Wurtzite Al1-xInxN (0.1<x<0.9) by Dual Reactive DC Magnetron Sputter Deposition”, Accepted J. Appl. Phys. (2004).

V. M. Kugler, F. Söderlind, D. Music, U. Helmersson, J. Andreasson, and T. Lindbäck, "Microstructure/ /Dielectric Property Relationship of Low Temperature Synthesised

(Na,K)NbOx Thin Films", J.Cryst.Growth 262, 322 (2004).

T. Seppänen, P.O.Ĺ. Persson, G.Z. Radnoczi, B. Pecz, L. Hultman, and J. Birch: “Structural Characterization of Wurtzite Al1-xInxN (0.1<x<0.9) Grown by Dual Reactive

Magnetron Sputter Deposition”, Society of Vacuum Coaters (SVC) 47th Ann. Techn. Conf. Proc., Dallas , (2004).

V. Chirita: “From Ab-initio to Classical Computational Studies in Thin Film Science”, Invited Paper, ICMCTF, San Diego (2004).

E. Janzén, J.P. Bergman, Ö. Danielsson, U. Forsberg, C. Hallin, J. ul Hassan, A. Henry, I.G. Ivanov, A. Kakanakova-Georgieva, P. Persson and Q. ul Wahab: ”SiC and III-nitride growth in a hot-wall CVD reactor” Mat. Sci. Forum In Press (2004).

T. Seppänen, P. O. Ĺ. Persson, G.Z Radnóczi, B. Pécz, L. Hultman and J. Birch “Structural Characterization of Wurtzite Al1-xInxN (0.1<x<0.9) Grown by Dual Reactive

DC Magnetron Sputter Deposition” SVC 47th Annual Technical Conference Proceedings, p. 347-352 (2004).

P. Isberg, T. Liljenberg, L. Hultman, and U. Jansson: “A New Nanostructured Coumpound Reduces Wear”, ABBreview, 1, 64 (2004).

L. Hultman and C. Mitterer: ”Thermal Stability of Advanced Nano-structured Wear-Resistant Coatings”, In “Hard Nanostructured Coatings”, ed. by Albano Cavaleiro and Jeff Th. M. De Hosson Plenum Press (2004).

L. Hultman and A. Hörling: “Auto-Organized Nanostructures in the Ti-Al-N Thin Film System”, in Surfaces And Interfaces Of Nanostructured Materials. Edited by S.M. Mukhopadhyay, S. Seal, N.B. Dahotre and A. Agarwal, The Minerals, Metals & Materials Soc., Warrendale, PA 15086, USA), (2004).

L. Hultman: “Materials Science of Wear-Protective Nanostructured Thin Films”, in ”Nanostructured Thin Films and Nanodispersion Strengthened Coatings” (NATO

Science Series II Mathematics, Physics and Chemistry – Vol 155; ed. by A.A. Voevodin et al, Kluwer Academic Publishers, Dordrecht, The Netherlands, 2004) Ch. 2, page 9-21.

D. Trinh and M. Collin: “Wear Resistance and XRD Studies on Alumina Coatings. Part 1: Alpha- and Kappa- Alumina”, Internal Report, AB Sandvik Tooling (2004).

L. Hultman, P. Eklund, H. Högberg, J. Emmerlich, and P. Isberg: ”Amorphous and nanocomposite MAX compounds for wear protective coatings on components

and tools as well as electrical contacts” US Patent no. 60/511,424 (2004).

P. Eklund, J. -P. Palmquist, O. Wilhelmsson, U. Jansson, J. Emmerlich, H. Högberg, and L. Hultman: ”Comment on ”Pulsed laser deposition and properties of Mn+1AXx phase

formulated Ti3SiC2 thin films””, Trib. Lett., 17, 977-978 (2004).

J. M. Andersson: “Low temperature growth of alumina”, Licentiate Thesis No. 1073, (2004).

J. Böhlmark: "The effect of extreme power densities applied to a planar magnetron", Licentiate Thesis No. 1076, (2004).

J. Emmerlich: “Thin Film Growth and Characterization of Ti-Si-C MAX-Phases”,

Licentiate Thesis No. 1100. (2004).

T. Seppänen: “Magnetron Sputter Epitaxy of 2h-Al1-xInxN Thin Films”, Licentiate Thesis No. 1072

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Last updated: 05/06/08