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MUSIC, Denis: Boron Suboxide Based Thin Films.

Dissertation No 835 (25 september 2003)

ALAMI, Jones: Plasma, characterisation in high powr pulsed magnetron sputering.

Thesis No 1013. LiU-TEK-LIC 2003:12

JOELSSON: Growth, Structure and Properties of Ternary Transition Metal Nitride

Thin Films Prepared by Readtive Magnetron Sputtering. Thesis No 1029

. Birch, F. Eriksson, G.A. Johansson, and H.M. Hertz: “Recent Advances in Ion-Assisted Growth of Cr/Sc Multilayer X-Ray Mirrors for the Water Window”,

Vacuum 68 (3), 65-72 (2003)

E. Broitman, O.P.A. Lindquist, N. Hellgren, L.Hultman, and B.C. Holloway: “Structural, Electrical and Optical Properties of DLC Films Deposited by DC Magnetron Sputtering”,

J. Vac. Sci Technol. A21 (2003) L23.

E. Broitman, N. Hellgren, Zs. Czigany, R. Twesten, J.Luning, I. Petrov, L.Hultman, and B.C.Holloway: ”Structural and Mechanical Properties of DLC Films

Deposited by DC Magnetron Sputtering”, J. Vac. Sci.Technol. A21 (2003) 851.

Zs. Czigany, J. Neidhardt, I.F. Brunell, and L.Hultman: “Imaging of Fullerene-like Structures in CNx Thin Films by Electron Microscopy; Sample Preparation Artefacts from Ion-Beam Milling”,

Ultramicroscopy 94 (2003) 163.

A.P. Ehiasarian, W.-D. Münz, L. Hultman, U. Helmersson, and I. Petrov: ”High Power Pulsed

Magnetron Sputtered CrNx Films”, Surf. Coat. Technol. 163-164 (2003) 267.

A.P. Ehiasarian, P. Eh. Hovsepian, W.-D. Münz, L. Hultman, and U. Helmersson: “Comparison of microstructure and mechanical properties of chromiumnitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique”, Thin Solid Films, 2003

F. Eriksson, G.A. Johansson, H.M. Hertz, E.M. Gullikson, and J. Birch: “14.5% normal incidence

reflectance of Cr/Sc x-ray multilayer mirrors for the water window”, Optics Letters, 28 (24), (2003)

A. Hallen, M.S. Jansson, J. Osterman, U. Zimmerman, M. Linnarson, A. Kuznetsov, Y. Zhang, P.O.Ĺ. Persson and B.G. Svensson: ”Implanted pn juctions in Silicon Carbide”, Application of Accelerators In Research and Industry p. 653 (2003)

H.M. Hertz, G.A. Johansson, H. Stollenberg, J. de Groot, O. Hemberg, A. Holmberg, S. Rehbein, P. Jansson, F. Eriksson, and J. Birch: “Table-Top X-ray Microscopy: Sources, Optics and Applications”, J. Physique IV 104, 115-119 (2003)

L. Hultman, J. Neidhardt, N. Hellgren, H. Sjöström, and J.-E. Sundgren: “Fullerene-like Carbon Nitride; A Resilient Coating Material”, Materials Research Society Bulletin, 28 (March) (2003) 194.

L. Hultman, J. Neidhardt, N. Hellgren, H. Sjöström and J.-E. Sundgren, Fullerene-Like Carbon Nitride; A Resilient Coating Material, MRS Bull. 28 (3), 194


H.W. Hugosson, H. Högberg, M. Ahlgren, M. Rodmar, and T. I. Selinder: “A theoretical study on the effects of substitutions on the phase stabilities and electronic structure of TixAl1-xN”, J. Appl. Phys., 93, 4505 (2003).

J. Hĺllstedt, E. Suvar, P. O. Ĺ. Persson, L.Hultman, Y. -B. Wang and H. H. Radamson: “Growth of high quality epitaxial Si1-x-yGexCy layers by using chemical vapor deposition”, Appl. Surf. Sci (2003)

J.A.D.Jensen, P. Pocwiardowski, P.O.Ĺ.Persson, L. Hultman and P. Moller: “Acoustic streaming enhanced electrodeposition of nickel”, Chem. Phys. Lett. v 368, p

732-7 (2003).

J.A.D. Jensen, P.O.Ĺ. Persson, K. Pantleon, M. Odén, L. Hultman, and M.A.J. Somers: “Electrochemically Deposited Nickel Membranes; Process-Microstructure-

Property Reolationships”, Surf. Coat. Technol. 172 (2003) 79

L. Karlsson, G. Ramanath, M. Johansson, A. Hörling, and L. Hultman: “The influence of thermal annealing on residual stresses and mechanical properties of arcevaporated

TiCxN1-x (x = 0, 0.15 & 0.45) thin films”, Acta Materialia, 50 (2003) 5103.

V.M. Kugler, F. Söderlind, D. Music, U.Helmersson, J. Andreasson, and T. Lindbäck, “Low temperature growth and characterization of (Na, K)NbOx thin films”, J. Cryst. Growth 254, 400 (2003).

L. Landström, Zs. Márton, N. Arnold, H. Högberg, M. Boman and P. Heszler: “In-situ monitoring of sizedistributions and characterization of nanoparticles during W ablation in N2 atmosphere”, J. Appl. Phys., 94, 2011 (2003).

P. H. Mayrhofer, A. Hörling, L. Karlsson, J. Sjölén, C. Mitterer, L. Hultman: ”Self-organized nanostructures in the Ti-Al-N system”, Appl. Phys. Lett. 83(10) (2003)


C. Menon, A.-C. Lindgren, P.O.Ĺ. Persson, L. Hultman, and H.H. Radamson: “Selective Epitaxy of Si1-xGex Layers for CMOS Applications”, J. of

Electrochemical Soc. 150 (4) (2003) 253-257 J. Molina-Aldareguia, J. Emmerlich, J.-P. Palmquist, U. Jansson, and L. Hultman: “Kink Formation around Indents in Laminated Ti3SiC2 Thin Films Studied in the Nanoscale”, Scripta Materialia 49 (2003) 155

E.P. Münger, V. Chirita, L. Hultman, and J.E. Greene: “Adatom/Vacancy Interactions and Interlayer Mass Transport in Small Two-Dimensional Pt Clusters on

Pt(111)”, Surf. Sci. Lett., (2003)

D. Music, V. Chirita, U. Kreissig, Z. Czigány, J.M. Schneider, and U. Helmersson, “On quantum design and synthesis of boron-oxygen-yttrium phase”, Appl.Phys.Lett. 82, 4286 (2003).

D. Music, V.M. Kugler, Z. Czigány, A. Flink, O. Werner, J.M. Schneider, L. Hultman, and U.

Helmersson, “The role of carbon in boron suboxide thin films”, J.Vac.Sci.Tech.A 21, 1355 (2003).

D. Music, U. Kreissig, V. Chirita, J.M. Schneider, and U. Helmersson, “Elastic modulus of amorphous boron suboxide thin films studied by theoretical and experimental methods”, J. Appl. Phys. 93, 940 (2003).

D. Music, U. Kreissig, Z. Czigány, U. Helmersson, J.M. Schneider, “Elastic modulus-density relationship for amorphous boron suboxide thin films”, Applied Physics A 76, 269 (2003).

J. Neidhardt, B. Abendroth, R. Gago, W. Möller and L. Hultman, Diagnostics of an Ar / N2 Magnetron Discharge and Process Characterisation for the Sputter- Deposition of Fullerene-Like Carbon Nitride Films J. Appl. Phys. 94 (11), 7059 (2003), also in Virtual

Journal of Nanoscale Science & Technology November

24th 2003.

J. Neidhardt, Zs. Czigány, I. F. Brunell and L. Hultman, Growth of Fullerene-Like CNx by Reactive Magnetron Sputtering; Role of Low-Energy Ion Irradiation in Determining Microstructure and Mechanical Properties, J. Appl. Phys. 93 (5), 3002 (2003), also in Virtual Journal of Nanoscale Science & Technology March 17th 2003.

J. Neidhardt, and L. Hultman: ”Superelastic Fullerenelike Carbon Nitride Coatings Synthesized by Reactive Unbalanced Magnetron Sputtering” (Bodycote International Prize Paper Competition: Winner) Surface Engineering 9 (2003) 1

P.O.Ĺ. Persson, L. Hultman, M. Jansson and A. Hallén: “Dislocation Loop Evolution of Ion Implanted 4HSiC”, J. Appl. Phys. 93, 9395 (2003) I. Petrov, P. Barna, L. Hultman, and J.E. Greene: “Microstructural Evolution during Thin Film Growth”, J. Vac.Sci Technol. A21 (2003) S117

J.-P. Palmquist, Zs. Czigány, L. Hultman, U. Jansson: “Epitaxial growth of tungsten carbide films using C60 as carbon precursor”, J. Cryst. Growth. 259 (2003) 12. J.-P. Palmquist, Zs. Czigany, M. Odén, J. Neidhart, L. Hultman, U. Jansson: “Magnetron sputtered W-C films with C60 as carbon source”, Thin Solid Films 444 (2003) 29

G. Radnóczi, G. Sáfrán, Zs. Czigány, T. Berlind, and L. Hultman: ”Structure of DC Sputtered Si-C-N Thin Films”, Thin Solid Films, 440 (2003) 41

J. Rosén, A. Anders, L. Hultman, and J.M. Schneider: “Temporal Development of the Plasma Composition of Metal Plasma Streams in a Reactive Environment”, J. Appl. Phys. 94 (2003) 1414.

J. Sundqvist, H. Högberg and A. Hĺrsta: “Atomic Layer Deposition of Ta2O5 by using the TaI5 and O2 precursor combination”, Chemical Vapor Deposition,

9, 245 (2003).

A.E. Ĺbom, E. Comini, G. Sberveglieri, N. Finnegan, L. Hultman, and M. Eriksson: “Experimental evidence for a dissociation mechanism in NH3 detection with

MIS field-effect devices ”, Sensors and Actuators B89,

A.E. Ĺbom, E. Comini, G. Sberveglieri, N. Finnigan, L. Hultman, and M. Eriksson: “Experimental evidence for a dissociation mechanism in NH3 detection with

MIS field-effect devices”, Sensors and Actuators B89, 1 (2003)

A.E. Ĺbom, R.T. Haasch, N. Hellgren, N. Finnegan, L. Hultman, and M. Eriksson, “Characterization of the Metal-Insulator Interface of Field-Effect Chemical

Sensors”, J. Appl. Phys. 93 (2003) 9760

T. Seppänen, G.Z. Radnoczi, S. Tungasmita, L. Hultman, and J. Birch: “Growth and Characterization of Epitaxial Wurtzite Al1-xInxN Thin Films Deposited by UHV Reactive Dual Magnetron Sputtering”, In Silicon Carbide and Related Materials, Ed. P. Bergman

and E. Janzén; Materials Science Forum Vols 433-426, (Trans Tech Publ.,Switzerland, 2003) pp. 989-990

L. Storasta, G. Pozina, J. Birch, L. Hultman, and E. Janzén: “Implementation of Hot-Wall MOCVD in the Growth of High-Quality GaN on SiC”, In Silicon Carbide and Related Materials, Ed. P. Bergman and E. Janzén; Materials Science Forum Vols. 433-426, (Trans

Tech Publ. , Switzerland , 2003) pp. 991—994.

E. Valcheva, T. Paskova, G.Z. Radnoczi, L. Hultman, B. Monemar, H. Amano, and I. Akasaki:

”Microstructure Evolution of MOVPE-Grown AlN/GaN Superlattices with Different Periods”, Proc. 10th Europ. Workshop on MOVPE, Lecce , Italy , 8-11 June 2003

A.P. Ehiasarian, W.-D. Münz, L. Hultman, and U. Helmersson: CrN Deposition by Reactive High Power Density Pulsed Magnetron Sputtering, Vacuum Technology & Coating, Proc. April (2003) pp 40-46

J. Alami, P.O.Ĺ Persson, A. Hörling, J. Böhlmark and U. Helmersson, J.T. Gudmundsson, and D. Music, "Thin film deposition on a complex-shaped substrate by ionised pulsed sputtering", conference proceeding of the Pulsed plasma conference, September 17, 2003, Manchester, UK

J. Alami, J.T. Gudmundsson, J. Böhlmark, K.B. Gylfason and U. Helmersson, "Plasma Parameters During High Power Pulsed Magnetron Sputtering", conference proceeding of the 16th International Symposium on Plasma Chemistry, June 22-27, 2003, Taormina, Italy

J. Böhlmark, J. Alami, J.T. Gudmundsson, and U. Helmersson, Ionization of sputtered Ti during high power pulsed magnetron sputtering", published in the proceedings of the 7th International Symposium on Sputtering & Plasma Processes, June 11-13, 2003, Kanazawa , Japan .

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Last updated: 05/06/08