Recent Publications

Submitted

• The influence of ionization degree on film properties when using high power impulse magnetron sputtering
  
  
• Gas rarefaction and the time evolution of long high power impulse sputtering pulses
  
  
• Argon metastables in HiPIMS. Time-resolved tunable diode laser diagnostic
  
  
• Swedish Patent Proposal, Sputtering Process
  
  

  In press

• The high power impulse magnetron sputtering discharge, J.T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson, J. Vac. Sci. Technol. A, accepted.
  
  
• An introduction to thin film processing using high power impulse magnetron sputtering, D. Lundin and K. Sarakinos, J. Mater. Res., accepted.
  
  
• Understanding deposition rate loss in high power impulse magnetron sputtering, N. Brenning, D. Lundin, M. A. Raadu, C. Huo, C. Vitelaru, G. D. Stancu, T. Minea, and U. Helmersson, Plasma Sources Sci. Technol. accepted.
  
  
• Swedish Patent Proposal (Approved): 1050173-2, Plasmasputteringsprocess för att producera partiklar. PCT: WO 2011/105957 A1, Plasma Sputtering Process for Producing Particles, U. Helmersson, N. Brenning, D. Söderström.
  
  

  2012

• A strategy for increased carbon ionization in magnetron sputtering discharges, A. Aijaz, K. Sarakinos, D. Lundin, N. Brenning, U. Helmersson, Diamond and Related Materials 23, 1, (2012). DOI
  
  
• Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films, K. Sarakinos, A. Braun, C. Zilkens, S. Mráz, J.M. Schneider, H. Zoubos, P. Patsalas, Surf. Coat. Technol. 206, 2706 (2012). DOI
  
  
• Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions, M. Samuelsson, K. Sarakinos, H. Hogberg, E. Lewin, U. Jansson, B. Walivara, H. Ljungcrantz, U. Helmersson, Surf. Coat. Technol. 206, 2396 (2012). DOI
  
  

  2011

• Two-domain formation during the epitaxial growth of GaN (0001) on c-plane Al2O3 (0001) by high power impulse magnetron sputtering, M. Junaid, D. Lundin, J. Palisaitis, C.-L. Hsiao, V. Darakchieva, J. Jensen, P. O. A. Persson, P. Sandstrom, W.-J. Lai, L.-C. Chen, K.-H. Chen, U. Helmersson, L. Hultman, J. Birch, J. Appl. Phys., 110, 123519 (2011). DOI
  
  
• Studies of hysteresis effect in reactive HiPIMS deposition of oxides, T. Kubart, M. Aiempanakit, J. Andersson, T. Nyberg, S. Berg, U. Helmersson, Surf. Coat. Technol., 205, S303 (2011). DOI
  
  
• Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide, M. Aiempanakit, U. Helmersson, A. Aijaz, P. Larsson, R. Magnusson, J. Jensen, T. Kubart, Surf. Coat. Technol., 205, 4828 (2011). DOI
  
  
• Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides, Montri Aiempanakit, Tomáš Kubart, Petter Larsson, Kostas Sarakinos, Jens Jensen, Ulf Helmersson, Thin Solid Films, 519, 7779 (2011). DOI
  
  
• Internal current measurements in high power impulse magnetron sputtering, D. Lundin, S.A. Sahab, N. Brenning, Chunqing Huo, U. Helmersson, Plasma Sources Sci. Technol. 20, 045003 (2011). DOI
  
  
• Deposition rate loss in high power impulse magnetron sputtering: understanding through computational modeling, D. Lundin, C. Huo, N. Brenning, M. A. Raadu, U. Helmersson, Technical Conference Proceedings of the Society of Vacuum Coaters (2011). LINK
  
  

  2010

• Doctoral thesis: The HiPIMS Process, D. Lundin, Linköping studies in science and technology. Dissertations, ISBN 978-91-7393-419-0; 1305 (2010). LiU E-Press
  
  
• Ab-initio calculations and synthesis of the off-stoichiometric half-Heusler phase Ni1-xMn1+xSb, M. Ekholm, P. Larsson, B. Alling, U. Helmersson, I.A. Abrikosov, J. Appl. Phys. 108, 093712 (2010). DOI
  
  
• On the film density using high power impulse magnetron sputtering, M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson, U. Helmersson, Surf. Coat. Technol. 15, 591 (2010). DOI
  
  
• Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias, Martina Lattemann, Ulf Helmersson, Joe E. Greene, Thin Solid Films, 518, 5978 (2010). DOI
  
  
• Low-Temperature Superionic Conductivity in Strained Yttria-Stabilized Zirconia, Michael Sillassen, Per Eklund, Nini Pryds, Erik Johnson, Ulf Helmersson, Jørgen Bøttige, Adv. Funct. Mater. 20, 2071 (2010). DOI Corrections: Adv. Funct. Mater. 20, 3194 (2010).
  
  
• Dual-magnetron open field sputtering system for sideways deposition of thin films, Asim Aijaz, Daniel Lundin, Petter Larsson, and Ulf Helmersson, Surf. Coat. Technol. 204, 2165 (2010). DOI
  
  

  2009

• Faster-than-Bohm cross-B electron transport in strongly pulsed plasmas, N. Brenning, R. L. Merlino, D. Lundin, M. A. Raadu, and U. Helmersson, Phys. Rev. Lett. 103, 225003 (2009). DOI
  
  
• Energy flux measurements in high power impulse magnetron sputtering, D. Lundin, M. Stahl, H. Kersten, U.Helmersson, J. Phys. D 42, 185202 (2009). DOI
  
  
• Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering, D. Lundin, N. Brenning, D. Jädernäs, P. Larsson, E. Wallin, M. Lattemann, M.A. Raadu and U. Helmersson, Plasma Sources Sci. Technol. 18, 045008 (2009). DOI
  
  
• On the electron energy in the high power impulse magnetron sputtering discharge, J.T. Gudmundsson, P. Sigurjonsson, P. Larsson, D. Lundin, U. Helmersson, J. Appl. Phys. 105, 123302 (2009). DOI
  
  
• Low-temperature alpha-alumina thin film growth: ab initio studies of Al surface migration, E. Wallin. P. Munger, V. Chirita, U. Helmersson, J. Phys. D: Appl. Phys. 42, 125302 (2009). DOI, Free access through LiU E-press
  
  
• Master thesis: Alternative method for deposition of alumina thin films, Daniel Magnfält, LITH-IFM-EX-09/2046-SE (2009).
  
  
• Master thesis: Design and characterization of a synchronous co-axial double magnetron sputtering system, Asim Aijaz, LITH-IFM-EX-09/xxxx-SE (2009).
  
  
• alpha-Alumina coatings on WC/Co substrates by physical vapor depositio, T.I. Selinder, E. Coronel, E. Wallin, U. Helmersson, International Journal of Refractory Metals and Hard Materials 27, 507 (2009). DOI
  
  

  2008

• Doctoral thesis: Alumina Thin Films from Computer Calculations to Cutting Tools, E. Wallin, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 1221 (2008). LiU E-Press
  
  
• Licentiate thesis: Plasma properties in high power impulse magnetron sputtering, D. Lundin, Linköping studies in science and technology. Thesis No. 1358, ISSN 0280-7971, ISBN 978-91-7393-932-4 (2008). LiU E-Press
  
  
• A bulk plasma model for dc and HIPIMS magnetrons, N Brenning, I Axnäs, M A Raadu, D Lundin, U Helmerson, Plasma Sources Sci. Technol. 17, 045009 (2008). DOI
  
  
• Cross-field ion transport during high power impulse magnetron sputtering, D. Lundin, P. Larsson, E. Wallin, M. Lattemann, N. Brenning, U. Helmersson, Plasma Sources Sci. Technol. 17, 035021 (2008). DOI
  
  
• Hysteresis-free reactive high power impulse magnetron sputtering, E. Wallin, U. Helmersson, Thin Solid Films 516, 6398 (2008). DOI
  
  
• Synthesis of alpha-Al2O3 thin films using reactive high power impulse magnetron sputtering, E. Wallin, T. I. Selinder, M. Elfwing, U. Helmersson, Europhysics Letters 82, 36002 (2008). DOI
  
  
• Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films, E. Wallin, J.M. Andersson, M. Lattemann, U. Helmersson, Thin Solid Films 516, 3877 (2008). DOI
  
  
• Anomalous electron transport in high power impulse magnetron sputtering, D. Lundin, U. Helmersson, S. Kirkpatrick, S. Rohde, and N. Brenning, Plasma Sources Sci. Technol. 17, 025007 (2008). DOI
  
  

  2007

• Licentiate thesis: Alumina Thin Film Growth: Experiments and Modeling, E. Wallin, Linköping studies in science and technology. Thesis No. 1292, ISSN 0280-7971, ISBN 978-91-85715-98-5 (2007).
  
  
• Master thesis: Properties of Arc Evaporated Ti-Si-C-N Hard Coatings, Andreas Hedin, LITH-IFM-EX-07/1761-SE (2007).
  
  
• Master thesis: Growth of alumina thin films using reactive high power impulse magnetron sputtering, Staffan Swedin, LITH-IFM-EX-07/1712-SE (2007).
  
  
• Master thesis: Microstructural evolution and properties of TiN thin films deposited by HIPIMS, Martina Ahlberg, LITH-IFM-EX-07/1710-SE (2007).
  
  
• Investigation of structure and mechanical properties of magnetron sputtered monolayer and multilayer coatings in the ternary system Si–B–C, M. Lattermann, S. Ulrich, Surf.Coat.Technol. 201, 5564 (2007).
  
  
• Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering, J. Alami, P. Eklund, J.M. Andersson, M. Lattermann, E. Wallin, J. Bohlmark, P. Persson, U. Helmersson, Thin Solid Films 515, 3434 (2007). Free via LiU E-press
  
  

  2006

• Doctoral thesis: Fundamentals of High Power Impulse Magnetron Sputtering, J. Bohlmark, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 1014 (2006).
  
  
• Master thesis: Investigations of interfacial microstructure of CrN coatings on HSS substrates pretreated by HIPIMS for adhesion enhancement, Daniel Jädernäs, LiTH-IFM-EX-06/1643-SE (2006)
  
  
• Guiding the deposition flux in an ionized magnetron discharge, J. Bohlmark, M. Östbye, M. Lattemann, H. Ljungcrantz, T. Rosell, and U. Helmersson, Thin Solid Films 515, 1928 (2006). Free via LiU E-press
  
  
• High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target, J. Alami, P. Eklund, J. Emmerlich, O. Wilhelmsson, U. Jansson, H. Högberg, L. Hultman, and U. Helmersson, Thin Solid Films 515, 1731 (2006). Free via LiU E-press
  
  
• The ion energy distributions and plasma composition of a high power impulse magnetron sputtering discharge, J. Bohlmark, M. Lattemann, J.T. Gudmundsson, A.P. Ehiasarian, Y. Aranda Gonzalvo, N. Brenning, and U. Helmersson, Thin Solid Films 515, 1522 (2006). Free via LiU E-press
  
  
• New approach in depositing thick, layered cubic boron nitride coatings by oxygen addition—structural and compositional analysis, M. Lattemann, S. Ulrich, J. Ye, Thin Solid Films 515, 1058 (2006).
  
  
• Investigation of RuO2/4H-SiC Schottky diode contacts by deep level transient spectroscopy, D. Buc, L. Stuchlikova, U. Helmersson, W.H. Chang, I. Bello, Chemical Physics Letters 429, 617 (2006).
  
  
• Ab initio studies of Al, O, and O2 adsorption on a-Al2O3 (0001) surfaces, Erik Wallin, J.M. Andersson, E.P. Munger, V. Chirita, U. Helmersson, Phys.Rev.B.74, 125409 (2006).
  
  
• Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications, U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J.T. Gudmundsson, Thin Solid Films 513, 1 (2006). Free via LiU E-press
  
  
• Phase control of Al2O3 thin films grown at low temperatures, J.M. Andersson, E. Wallin, and U. Helmersson, Thin Solid Films 513, 57 (2006).
  
  
• Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures, J. Andersson, E. Wallin, P. Münger, U. Helmersson, J.Appl.Phys. 100, 033305 (2006).
  
  
• RF dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films, D. Trinh, H. Högberg, J. Andersson, M. Collin, I. Reineck, U. Helmersson, and L. Hultman, J.Vac.Sci.Technol. A 24, 309 (2006).
  
  
• Deep energy levels in RuO2/4H – SiC Schottky barrier structures, L. Stuchlikova, D. Buc, L. Harmatha, U. Helmersson, W. H. Chang, and I. Bello, Appl. Phys. Lett. 88, 153509 (2006).
  
  
• Molecular content of the deposition flux during reactive Ar/O2 RF magnetron sputtering of Al, J.M. Andersson, E. Wallin, E.P. Münger, and U. Helmersson, Appl.Phys.Lett. 88, 054101 (2006).
  
  
• Stress reduction in nanocomposite coatings consisting of hexagonal and cubic boron nitride, M. Lattemann, K. Sell, J. Ye, P.Å.O. Persson, and S. Ulrich, Surf.Coat.Technol. 200, 6459 (2006).
  
  
• Investigation of High Power Impulse Magnetron Sputtering Pretreated Interfaces for Adhesion Enhancement of Hard Coatings on Steel, M. Lattemann, A.P. Ehiasarian, J. Bohlmark, P.Å.O. Persson, U. Helmersson, Surf.Coat.Technol. 200, 6495 (2006).
  
  
• Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS), J. Bohlmark, M. Lattemann, H. Stranning, T. Selinder, J. Carlsson, U. Helmersson, Society of Vacuum Coaters, 49th Annual Technical Conference Proceedings, Washington DC 2006, p. 334.
  
  
• Ionized physical vapor deposition (IPVD) and especially high power impulse magnetron sputtering (HIPIMS), U. Helmersson, 4e Journees detude sur les nouvelles tendances en procedes magnetron et arc pour le depot de couches minces, Grenoble 2006, p. 1.
  
  

  2005

• Doctoral thesis: Controlling the Formation and Stability of Alumina Phases, J.M. Andersson, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 987 (2005).
  
  
• Doctoral thesis: Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering, J. Alami, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 948 (2005).
  
  
• Master thesis: Aluminiumplätering och korrosinsskydd med polymerfilmer av strålkastarreflektorer, Pontus Mannerheim, LITH-IFM-EX-05/1502-SE (2005).
  
  
• Master thesis: Study of tin whisker growth and their mechanical and electrical properties, Moheb Nayeri Hashemzadeh, LITH-IFM-EX-05/1499-SE (2005).
  
  
• Master thesis: Control of deposition flux in ionized sputtering, Mikael Östbye, LITH-IFM-EX-05/1495-SE (2005).
  
  
• Master thesis: Ion metal deposition of cylindrical substrates, Patrik Karlsson, LITH-IFM-EX-05/1491-SE (2005).
  
  
• Master thesis: Piezoelectric coatings on implants - Sample preparation and construction of test equipment for in vitro experiments, Annakarin Olsson, LITH-IFM-EX-05/1408-SE (2005).
  
  
• Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge, K.B. Gylfason, J. Alami, U. Helmersson, and J.T. Gudmundsson, J.Phys.D 38, 3417 (2005).
  
  
• Sol-gel synthesis and characterisation of Na0.5K0.5NbO3 thin films, Fredrik Söderlind, Per-Olov Käll, and Ulf Helmersson, J. Crystal Growth 281, 468 (2005).
  
  
• Eliminating the hysterersis effect for reactive sputtering processes, T. Nyberg, S. Berg, U. Helmersson, and K. Hartig, Appl.Phys.Lett. 86, 164106 (2005).
  
  
• High power impulse magnetron sputtering discharges and thin film growth: A brief review, U. Helmersson, M. Lattemann, J. Alami, J. Bohlmark, A.P. Ehiasarian, and J.T. Gudmundsson, Proceedings of the 48th Annual Technical Conference of the Society of Vacuum Coaters, April 23–28, 2005, Denver, CO, USA, p.458.
  
  
• Plasma Composition and Ion Energies in High Power Impulse Magnetron Sputtering, J. Bohlmark, A.P. Ehiasarian, M. Lattemann, J. Alami, and U. Helmersson, , Proceedings of the 48th Annual Technical Conference of the Society of Vacuum Coaters, April 23–28, 2005, Denver, CO, USA, p.470.
  
  
• Plasma dynamics in a highly ionized pulsed magnetron discharge, J. Alami, J.T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson, Plasma Sources Sci. Technol. 14, 525 (2005).
  
  
• Ion-assisted physical vapor deposition for enhanced film properties on non-flat surfaces, J. Alami, P.O.Å. Persson, J. Böhlmark, J.T. Gudmundsson, D. Music, and U. Helmersson, J.Vac.Sci.Technol.A 23, 278 (2005).
  
  
• Spatial electron density distribution in a high power pulsed magnetron discharge, J. Bohlmark, J.T. Gudmundsson, J. Alami, M. Latteman, U. Helmersson, IEEE Transactions on Plasma Science 33, 346 (2005).
  
  
• Hydrogen sensing by NKN thin film with high dielectric constant and Ferro-electric property, Shinji Nakagomi, G. Wingqvist, A.E. Åbom, U.Helmersson, and A. Lloyd Spetz, Sensors & Actuators B 108, 490 (2005).
  
  
• Ab initio calculations on the effects of additives on alumina phase stability, J.M. Andersson, E. Wallin, V. Chirita, E.P. Münger, and U. Helmersson, Phys. Rev. B 71, 014101 (2005).
  
  
• Ionization of sputtered metals in high power pulsed magnetron sputtering, J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian, and U. Helmersson, J. Vac. Sci. Technol.A 23, 18 (2005).