First in-situ x-ray diffraction during a turning operation
In June, we conducted the first experiments using our small-scale turning rig. Industrially relevant cutting conditions were used, resulting in high temperature in the contact zone, easily observed by the glowing chips. We successfully collected diffraction data from the tool in-situ during the turning operation.
Growth of ZrAlN thin films by magnetron sputtering
During spring, the first in-situ studies of thin film evolution during growth using our UHV magnetron sputtering system were conducted. The example to the right shows the diffraction pattern of a ZrAlN/TiN multilayer coating grown on a MgO 100 substrate. The image shows the diffraction signal from two periods of the multilayer, corresponding to a total ZrAlN thickness of approximately 30 nm.
Thermal stability of h-ZrAlN coatings
The thermal stability of arc evaporated hexagonal structured ZrAlN coatings were studied by a combination of small and wide angle x-ray scattering (SAXS and WAXS) experiments in-situ during annealing at beamline P07, Petra III. The results reveal that the decomposition of the h-ZrAlN phase is slow and the WAXS signal from this phase is still strong after 3 h at 1100 ° C, while c-ZrN forms in column boundaries of the coating during annealing.
Kinetics of the nucleation and growth of h-AlN in c-TiCrAlN coatings
The formation and growth of h-AlN in arc evaporated c-TiCrAlN coatings upon annealing were studied by wide angle x-ray scattering in-situ during annealing. It was observed that the transformation rate is dependent on the decomposition route and microstructure which both changes with chemical composition of the coating.
Responsible for this page: Thomas Lingefelt
Last updated: 07/03/15