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Deposition system for time-resolved studies during growth

Understanding the fundamentals of coating synthesis is essential for improving coating properties. We have designed a custom UHV deposition system specifically for high energy x-ray scattering studies, which allows us to study phase and microstructure evolution in-situ during growth. The UHV system has the possibility for both magnetron sputtering and cathodic arc evaporation, allowing for a large range of deposition conditions, from atomic-scale control to industrial growth conditions. 

Responsible for this page: Thomas Lingefelt
Last updated: 01/26/15