The research program is aimed at carrying out basic research and gaining fundamental knowledge for the synthesis of thin films from the vapor phase that can enable the development of new materials, design of interfaces at an atomic level, and synthesis processes. Emphasis is placed on those aspects of the science of materials that are concerned with the relationships between synthesis, structure/composition, properties, and modeling/simulation of thin solid films.

The film synthesis concerns deposition processes based on physical vapor deposition (magnetron sputtering and arc deposition techniques). The characterization is concentrated onto structural techniques such as electron microscopy and x-ray diffraction. Film properties (mechanical, optical, electrical) are investigated both using in-house equipment and in cooperation with other groups. Modeling and simulations are employed for growth as well as ion-surface interactions.