Welcome to
Abrasonis G, Oates T, Kovacs G J, Grenzer J, Persson P, Heinig K H H, Martinavicius A, Jeutter N, Baehtz C, Tucker M, Bilek M M M, Moeller W. Nanoscale precipitation patterns in carbon-nickel nanocomposite thin films: Period and tilt control via ion energy and deposition angle. Journal of Applied Physics, 108 (4), 043503 (2010).
Anders A, Lim S H N, Man Yu K, Andersson J, Rosén J, McFarland M, Brown J. High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition. Thin Solid Films 518 (12), 3313-3319 (2010).
Beckers M, Eriksson F, Lauridsen J, Baehtz C, Jensen J, Hultman L. Formation of basal plane fiber-textured Ti2AlN films on amorphous substrates. Physica Status Solidi: Rapid Research Letters 4, 121-123 (2010).
Beshkova M, Lorenzzi J, Jegenyes N, Birch J, Syväjärvi M, Ferro G, Yakimova R. Properties of 3C-SiC grown by sublimation epitaxy on different type of substrates. ICSCRM2009, Materials Science Forum, Vols. 645-648, 183-186 (2010).
Broitman E, Czigany Zs, Greczynski G, Bohlmark J, Cremer R, Hultman L. Industrial-scale deposition of highly adherent CNx films on steel substrates. Surface & Coatings Technology 204 (21-22), 3349-3357 (2010).
Czigany Zs, Hultman L. Interpretation of electron diffraction patterns from amorphous and fullerene-like carbon allotropes. Ultramicroscopy 110 (7), 815-819 (2010).
Dahlqvist M, Alling B, Abrikosov I A, Rosén J. Phase stability of Ti2AlC upon oxygen incorporation: A first-principles investigation. Physical Review B: Condensed Matter and Materials Physics 81 (2), 024111-1 – 024111-8 (2010).
Dahlqvist M, Alling B, Rosén J. Stability trends of MAX phases from first principles. Physical Review B: Condensed Matter and Materials Physics 81 (22), 220102 (2010).
Eklund P, Beckers M, Jansson U, Högberg H, Hultman L. The Mn+1AXn phases: Materials science and thin-film processing. Thin Solid Films 518 (8), 1851-1878 (2010).
Eriksson A. Cathodic arc synthesis of Ti-Si-C-N thin films from ternary cathodes. Linköping: Linköpings University (2010).
Frodelius J. Thick and thin Ti2AlC coatings. Linköping: Linköpings University (2010).
Frodelius J, Eklund P, Beckers M, Persson P, Högberg H, Hultman L. Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC. Thin Solid Films 518 (6), 1621-1626 (2010).
Frodelius J, Johannsson E, Córdoba J, Odén M, Hultman L. Annealing of thermally sprayed Ti2AlC coatings. Applied Ceramic Technology, 1-11 (2010).
Greczynski G, Hultman L. Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres. Vacuum 84 (9), 1159-1170 (2010).
Greczynski G, Jensen J, Bohlmark J, Hultman L. Microstructure control of CrNx films during high power impulse magnetron sputtering. Surface & Coatings Technology 205 (1), 118-130 (2010).
Greczynski G, Jensen J, Hultman L. CrNx films prepared by DC magnetron sputtering and high-power pulsed magnetron sputtering: A comparative study. Transactions on Plasma Science 38 (11), 3046-3056 (2010).
Höglund C. Growth and phase stability studies of epitaxial Sc-Al-N and Ti-Al-N thin films. Linköping: Linköpings University (2010).
Höglund C, Alling B, Birch J, Beckers M, Persson P O Å, Baehtz C, Czigány Zs, Jensen J, Hultman L. Effects of volume mismatch and electronic structure on the decomposition of ScAlN and TiAlN solid solutions. Physical Review B: Condensed Matter and Materials Physics 81 (22), 224101 (2010).
Höglund C, Birch J, Alling B, Bareño J, Czigány Zs, Persson P O Å, Wingqvist G, Zukauskaite A, Hultman L. Wurtzite-structure Sc1-xAlxN solid solution films grown by reactive magnetron sputter epitaxy: structural characterization and first-principles calculations. Journal of Applied Physics 107 (12), 123515 (2010).
Hug G, Eklund P, Orchowski A. Orientation dependence of electron energy loss spectra and dielectric functions of Ti3SiC2 and Ti3AlC2. Ultramicroscopy 110 (8), 1054-1058 (2010).
Johnson L. Nanostructuring and age hardening in TiSiCN, ZrAlN, and TiAlN thin films. Linköping: Linköpings University (2010).
Johnson L, Rogström L, Johansson M, Odén M, Hultman L. Microstructure evolution and age hardening in (Ti,Si)(C,N) thin films deposited by cathodic arc evaporation. Thin Solid Films 519 (4), 1397-1403 (2010).
Jokubavicius V, Palisaitis J, Vasiliauskas R, Yakimova R, Syväjärvi M. Macrodefects in cubic silicon carbide crystals. ICSCRM2009, Materials Science Forum 645-648, 375-378 (2010).
Khranovskyy V, Tsiaoussis I, Yazdi G, Hultman L, Yakimova R. Heteroepitaxial ZnO nano hexagons on p-type SiC. Journal of Crystal Growth 312 (2), 327-332 (2010).
Lauridsen J, Eklund P, Joelsson T, Ljungcrantz H, Öberg Å, Lewin E, Jansson U, Beckers M, Högberg H, Hultman L. High-rate deposition of amorphous and nanocomposite Ti-Si-C multifunctional coatings. Surface & Coatings Technology 205 (2), 299-305 (2010).
Lewin E, Buchholt K, Lu J, Hultman L, Lloyd Spetz A, Jansson U. Carbide and nanocomposite thin films in the Ti-Pt-C system. Thin Solid Films 518 (18), 5104-5109 (2010).
Lu J, Luo J, Zhang S L, Ostling M, Hultman L. On epitaxy of ultrathin Ni1-xPtx silicide films on Si(001). Electrochemical and Solid State Letters 13 (10), H360-H362 (2010).
Luo J, Qiu Z, Zha C, Zhang Z, Wu D, Lu J, Akerman J, Ostling M, Hultman L, Zhang S L. Surface-energy triggered phase formation and epitaxy in nanometer-thick Ni1-xPtx silicide films. Applied Physics Letters 96 (3), 031911 (2010).
Magnuson M, Mattesini M, Höglund C, Birch J, Hultman L. Electronic structure of GaN and Ga investigated by soft x-ray spectroscopy and first-principles methods. Physical Review B: Condensed Matter and Materials Physics 81 (8), 085125 (2010).
Marten T, Isaev E, Alling B, Hultman L, Abrikosov I. Single-monolayer SiNx embedded in TiN: A first-principles study. Physical Review B: Condensed Matter and Materials Physics 81 (21), 212102 (2010).
Oberg A, Kassman A, Andre B, Wiklund U, Lindquist M, Lewin E, Jansson U, Högberg H, Joelsson T, Ljungcrantz H. Conductive nanocomposite ceramics as tribological and electrical contact materials. European Physical Journal: Applied Physics 49 (2), 22902 (2010).
Pedersen K, Bottiger J, Sridharan M, Sillassen M, Eklund P. Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering. Thin Solid Films 518 (15), 4294-4298 (2010).
Pozina G, Yang L L, Zhao Q, Hultman L, Lagoudakis P G. Size dependent carrier recombination in ZnO nanocrystals. Applied Physics Letters 97 (13), 131909 (2010).
Rivelino R, dos Santos R B, de Brito Mota F, Gueorguiev G K. Conformational effects on structure, electron states, and Raman scattering properties of linear carbon chains terminated by graphene-like pieces. Journal of Physical Chemistry C 114 (39), 16367-16372 (2010).
Rogström L, Johnson L, Johansson M, Ahlgren M, Hultman L. Thermal stability and mechanical properties of arc evaporated ZrN/ZrAlN multilayers. Thin Solid Films 519 (2), 694-699 (2010).
Rogström L, Johnson L, Johansson M P, Ahlgren M, Hultman L, Odén M. Age hardening in arc-evaporated ZrAlN thin films. Scripta Materialia 62 (10), 739-741 (2010).
Rosén J, Dahlqvist M, Simak S, McKenzie D R, Bilek M M M. Oxygen incorporation in Ti2AlC: Tuning of anisotropic conductivity. Applied Physics Letters 97 (7), 073103 (2010).
Sangiovanni D, Chirita V, Hultman L. Electronic mechanism for toughness enhancement in TixM1-xN (M=Mo and W). Physical Review B 81 (10), 104107 (2010).
Sillassen M, Eklund P, Pryds N, Bonanos N, Bottiger J. Concentration-dependent ionic conductivity and thermal stability of magnetron-sputtered nanocrystalline scandia-stabilized zirconia. Solid State Ionics 181 (23-24), 1140-1145 (2010).
Sillassen M, Eklund P, Pryds N, Bottiger J. Effects of dopant concentration and impurities on the conductivity of magnetron-sputtered nanocrystalline yttria-stabilized zirconia. Solid State Ionics 181 (19-20), 864-867 (2010).
Sillassen M, Eklund P, Pryds N, Johnson E, Helmersson U, Bottiger J. Low-temperature superionic conductivity in strained yttria-stabilized zirconia. Advanced Functional Materials 20 (13), 2071-2076 (2010).
Sonestedt M, Frodelius J, Palmquist J P, Högberg H, Hultman L, Stiller K. Microstructure of high velocity oxy-fuel sprayed Ti2AlC coatings. Journal of Materials Science 45 (10), 2760-2769 (2010).
Sonestedt M, Frodelius J, Sundberg M, Hultman L, Stiller K. Oxidation of Ti2AlC bulk and spray deposited coatings. Corrosion Science 52 (12), 3955-3961 (2010).
Tasnadi F, Alling B, Höglund C, Wingqvist G, Birch J, Hultman L, Abrikosov I. Origin of the anomalous piezoelectric response in wurtzite ScxAl1-xN alloys. Physical Review Letters 104 (13), 137601 (2010).
ul-Hassan J, Bergman P, Palisaitis J, Henry A, McNally P J, Anderson S, Janzén E. Growth and properties of SiC on-axis homoepitaxial layers. ICSCRM 2009, Materials Science Forum Vols. 645-648, 83-88 (2010).
Wingqvist G, Tasnadi F, Zukauskaite A, Birch J, Arwin H, Hultman L. Increased electromechanical coupling in w-ScxAl1-xN. Applied Physics Letters 97 (11), 112902 (2010).
Zhu J, Eriksson A, Ghafoor N, Johansson M P, Sjolen J, Hultman L, Rosén J, Odén M. Characterization of worn Ti-Si cathodes used for reactive cathodic arc evaporation. Journal of Vacuum Science and Technology A 28 (2), 347-353 (2010).
