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Laboratory exercises (0.5 ECTS)

The laboratory excersices are mandatory (an attendance list will be circulated)!

Two laboratory excersices are offered:

1. Computer simulations of film growth (Location: Hertz (H305))

Please prepare for the laboratory exercise by reading the corresponding compendium

(link "Simulation lab compendium" in the Course files directory)

The schedule for the computer simulation laboratory exercise can be found in the "Schedule_simulation_lab_2016.pdf" in the Course files directory

2. Thin film synthesis via physical vapor deposition (Location: Clean room, F building)

In this laboratory excercise a thin film will be synthesized by using two physical vapor deposition (PVD) methods, namely:

  • Direct current magnetron sputtering (DCMS)
  • High power impulse magnetron sputtering (HiPIMS)

Thin film growth will be monitored in situ (i.e., in real time) by means of an optical sensing technqiue called spectroscopic ellipsometry.

The characteristics of the two synthesis processes will be studied by the plasma (glow discharge) diagnostic technique called time- and energy-resolved mass spectrometry.

Please prepare for the laboratory exercise by reading the corresponding compendium

(file "PVD lab compendium.pdf" in the Course files directory)

The schedule for the PVD laboratory exercise can be found in the "Schedule_PVD_lab_2016.pdf" in the Course files directory


Responsible for this page: Kostas Sarakinos
Last updated: 02/01/16