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Chemical Vapor Deposition

A sketch of processes during CVD, adapted from K. F. Jensen, in Chemical Vapor Deposition, eds. M. L. Hitchman and K. F. Jensen, Academic Press, San Diego, 1993.


Chemical Vapor Deposition (CVD) is a process for the synthesis of thin films via chemical reactions between molecules in gas phase and on a surface. CVD processes are used in a great number of applications e.g. for hard coatings on metal cutting tools, for making modern computer chips and for coating window glass. 

A good and fairly recent overview on CVD is the review by K. L. Choy “Chemical Vapor Deposition of coatings”, Progress in Materials Science 48, 57 (2003)

The CVD research at Inorganic Chemistry is headed by Assoc. Prof. Henrik Pedersen and is currently focused on understanding and development of various types of CVD processes mainly for electronic materials. The current CVD research projects are:

Responsible for this page: Maria Sunnerhagen
Last updated: 01/13/16